| abstract |
Provided is a photosensitive resin composition that can form a pattern having excellent storage stability, low exposure, and excellent accuracy. Moreover, the formation method of the pattern which consists of a polysiloxane film using the said photosensitive resin composition is provided. Furthermore, providing an electronic component provided with the pattern which consists of a polysiloxane film formed using the said photosensitive resin composition. One or more selected from the group consisting of (A) a hydrolyzable silane compound, a hydrolyzate of the hydrolyzable silane compound, and a condensate thereof, and (B) a photobase generator or a photoacid. (C) A compound that generates an imidazole compound having a specific structure by light is added to the photosensitive resin composition containing the generator. [Selection figure] None |