| abstract |
[PROBLEMS] To generate a novel compound, a base generator and a base generator which have high base strength and have a base generation reaction that is performed in a chain when applied to an epoxy compound, etc. A photosensitive resin composition is provided. [Solution] Since the base generator of the present invention is a carboxylic acid salt composed of a predetermined carboxylic acid and an alkali metal or alkaline earth metal, imidazole, guanidine or phosphazene derivative, it is decarboxylated by light, and water in the air The basicity is high due to generation of strong alkali by the action and the reaction efficiency is excellent. In the case where the photosensitive resin composition is constituted together with the base-reactive compound, the reaction between the base generated from the base generator and the epoxy compound proceeds in a chain, and the curing is promptly performed even at the room temperature level. Since it becomes a photosensitive resin composition that is sufficiently cured by being implemented, it can be suitably used for, for example, a highly sensitive photocuring material or resist material. [Selection] Figure 1 |