| abstract |
A photocurable composition having excellent sensitivity, heat resistance, solvent resistance and transferability is provided. An epoxy adduct (A) having a structure in which an unsaturated monobasic acid (b) is added to a bifunctional epoxy compound (a) represented by the following general formula (I), a radical photopolymerization initiator ( A photocurable composition containing B) and a solvent (C). [Selection figure] None |