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filingDate 2013-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34dc18b554c98efb690b9d8b776abb16
publicationDate 2014-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2014122416-A
titleOfInvention Degreasing agent for photo solder resist pretreatment and degreasing method using the same
abstract A degreasing agent for pretreatment of a photo solder resist, which does not deteriorate the bondability between a printed circuit board and PSR ink, has excellent cleaning power, and can significantly reduce copper appearance defects and SR foreign matter defects, and the same. A degreasing method is provided. A degreasing agent for pretreatment of a photo solder resist of the present invention contains glycol ether, alcohol amine, amine surfactant and water. [Selection figure] None
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