| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 |
| filingDate |
2012-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68f8c11025ab5ae5c222fe8eab7f083c |
| publicationDate |
2014-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2014085412-A |
| titleOfInvention |
Resist composition and resist pattern forming method |
| abstract |
To obtain a resist pattern with reduced roughness and excellent mask reproducibility in forming a resist pattern. A resist composition that generates an acid upon exposure and changes its solubility in a developer by the action of an acid, the substrate component (A) having a change in solubility in a developer by the action of an acid; An acid generator component (B) that generates an acid upon exposure, and the base material component (A) is a structural unit containing an acid-decomposable group whose polarity is increased by the action of an acid, and a lactone-containing cyclic group A polymer compound (A1) having a structural unit (a0) containing a group, —SO 2 -containing cyclic group or carbonate-containing cyclic group, and the acid generator component (B) has proton acceptor properties. A resist composition comprising an acid generator (B1) comprising a compound having a nitrogen atom having an acid generating site that generates an acid upon exposure in the same molecule. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020158467-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014142424-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2020158467-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022070997-A1 |
| priorityDate |
2012-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |