http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014032391-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-041 |
| filingDate | 2013-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_644dc592a1857e788834137cfd38d763 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e75566e5be4a9ded4937b8988ae1ebc5 |
| publicationDate | 2014-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2014032391-A |
| titleOfInvention | Photosensitive resin composition for glass processing and glass processing method |
| abstract | A photosensitive resin composition for glass processing capable of forming a resin pattern having a high aspect ratio while having high etching resistance and excellent resolution, and suppressing side etching, and the photosensitive property for glass processing. A glass processing method using a resin composition is provided. A photosensitive resin composition for glass processing according to the present invention comprises a resin having a hydroxyl group and a weight average molecular weight of 20000 or more, and at least one filler selected from the group consisting of polyolefin fine particles and inorganic salt fine particles. contains. The glass processing method according to the present invention includes a resin layer forming step of forming a resin layer made of the glass processing photosensitive resin composition on a glass substrate, an exposure step of selectively exposing the resin layer, and after exposure. A developing step of developing the resin layer to form a resin pattern, an etching step of etching the glass substrate using the resin pattern as a mask, and a peeling step of peeling the resin pattern. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113671794-A |
| priorityDate | 2012-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 494.