Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate |
2013-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5783c924eb99533d01f0b89dc260e78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f245ddfecb97f7771c44d356e4580e0 |
publicationDate |
2014-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2014032388-A |
titleOfInvention |
Resist composition and method for producing resist pattern |
abstract |
Provided is a resist composition capable of producing a negative resist pattern with excellent pattern collapse resistance. An acid comprising a structural unit represented by formula (I), a resin having at least one selected from a group of structural units having two types of acid-dissociable groups, and a salt represented by formula (B1) A resist composition containing a generator. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014215548-A |
priorityDate |
2012-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |