| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76898
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3085 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-58 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G79-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01F7-02 |
| filingDate |
2010-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2013-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013534039-A |
| titleOfInvention |
Alumina based etch resistant coating |
| abstract |
A method of forming a protective hard mask layer on a substrate in a semiconductor etching process, comprising the step of applying a solution or colloidal dispersion of an alumina polymer onto the substrate by a solution deposition method, The dispersion is a method obtained by hydrolyzing and condensing at least one aluminum oxide precursor monomer in a solvent or solvent mixture in the presence of water and a catalyst. In a TSV process for forming a high aspect ratio via structure on a semiconductor substrate, the present invention can be used for manufacturing a hard mask. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3975223-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019167971-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200125582-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011236142-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023114214-A1 |
| priorityDate |
2010-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |