| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-463 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2636
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2012-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c711d7d4fcb09d3c3120d721134274a |
| publicationDate |
2013-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013243218-A |
| titleOfInvention |
Plasma processing apparatus and plasma processing method |
| abstract |
To maintain uniformity of temperature of a dielectric. A plasma processing apparatus includes a processing container that defines a processing space, a microwave generator, and a dielectric window having a facing surface that faces the processing space. The plasma processing apparatus 10 is provided on a surface 20 b opposite to the facing surface 20 a of the dielectric window 20, and plasma is generated via the dielectric window 20 based on the microwave generated by the microwave generator 16. An antenna 18 that radiates excitation microwaves to the processing space S is provided. The antenna 18 includes a slot plate 30 provided on a surface 20b opposite to the facing surface 20a of the dielectric window 20 and formed with a plurality of slots 30a. Inside the slot plate 30, a heater 31 is provided. Provided. By the heat treatment by the heater 31 provided inside the slot plate 30, the temperature uniformity of the dielectric window 20 is maintained. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102491984-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7284245-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10832892-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190103367-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6998129-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102376942-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11521830-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113611587-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017224804-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019521618-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220038637-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11109451-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102457581-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170123254-A |
| priorityDate |
2012-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |