http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013186233-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b19eaa8e535da4e4bceed99917a68153 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-10 |
| filingDate | 2012-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f900417fd7b8912f7887a28742e9f038 |
| publicationDate | 2013-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013186233-A |
| titleOfInvention | Resin composition for photoresist |
| abstract | Disclosed is a photoresist resin composition having good sensitivity and resolution, high residual film properties, and other characteristics that are not inferior to those of general-purpose products. SOLUTION: A novolak-type phenol resin obtained by reacting phenols containing metacresol, para-cresol and 2,3,6-trimethylphenol with formaldehyde in the presence of an acid catalyst, a naphthoquinonediazide derivative and a solvent In the photoresist resin composition, the phenol preferably further contains 2,3,5-trimethylphenol. [Selection figure] None |
| priorityDate | 2012-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 63.