| abstract |
PROBLEM TO BE SOLVED: To provide a phenolic resin for photoresist which has both high heat resistance, high resolution and high sensitivity. SOLUTION: Methacresol 30-70% by weight and paracresol 5-40 Phenols (P) consisting of 5% to 50% by weight of xylenol and / or trimethylphenol, formaldehyde (f1) and aromatic aldehydes (f2), and their weight ratio (f1 / f2) is 1/9. A novolak-type phenol resin obtained by reacting an aldehyde (F) which is -9/1, wherein the novolak-type phenol resin has a radius of inertia (molecular size). Is 1.50-2.50 nm. |