Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2242-26 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32706 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
2012-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f8d0bf8fd842c6fee698a0c1ede3353 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6be85cad85c49b7b1dd62cfa3eb0de02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0975197f290f3111b1beeba81f1c6254 |
publicationDate |
2013-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2013182996-A |
titleOfInvention |
Dry etching apparatus and dry etching method |
abstract |
Provided is a dry etching apparatus capable of highly uniform etching even when a quartz shower plate is used in order to use a corrosive gas. In a dry etching apparatus including a stage on which a wafer is placed, an antenna electrode, a high frequency power source, a shower plate, and a high frequency bias power source, a high frequency bias is provided on the antenna electrode side. The counter resonance grounding means 104 is provided which is in series resonance with the electrostatic reactance formed by the shower plate 116 with respect to the frequency of the frequency and changes the impedance by the variable inductive reactance and grounds it. [Selection] Figure 1 |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019061848-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190044608-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102484512-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017126717-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020065061-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9899424-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023043600-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020516024-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7115759-B2 |
priorityDate |
2012-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |