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filingDate 2012-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2013-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2013148425-A
titleOfInvention Semiconductor device and manufacturing method of semiconductor device
abstract An object of the present invention is to improve the detection accuracy of a semiconductor device for detecting various substances including biological substances such as DNA. The semiconductor device includes a channel region CH disposed on a first surface of a silicon oxide film 110, source and drain regions disposed on both sides of the channel region CH, and a channel on the first surface. A gate electrode G that is disposed apart from the region CH and is disposed to face the side surface xz1 of the channel region CH, an insulating film Z positioned between the channel region CH and the gate electrode G, and the channel region CH A pore P is disposed along the side surface xz1 so as to intersect the first surface. A test object such as DNA 200 is introduced into the pore P, and a change in electric field due to the test object with respect to the inversion layer 10 formed on the side surface xz1 of the channel region CH is detected as a change in current flowing between the source and drain regions. [Selection] Figure 2
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