| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0213 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32495
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-564
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02104 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2013-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47f4b34e42857524ae25d85dc8b6ff35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b4ccd24ad666c4a3d3c26f351768e7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de7b6cc503d73c78d3bd79559a5d8d48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06610037564f839ef8e148b783df43f1 |
| publicationDate |
2013-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013102236-A |
| titleOfInvention |
Protective coating for parts of plasma processing chamber and method of use thereof |
| abstract |
Protective coatings for parts of a plasma processing chamber and methods of use thereof United States Patent Application 20070249405 Kind Code: A1 A flexible coating used in a plasma chamber to protect RF straps from plasma-generated radicals such as fluorine radicals and oxygen radicals. An RF feedback strap coated with a polymer or an elastomer, and a method of processing a semiconductor substrate in a plasma processing apparatus with particle contamination suppressed. The coated RF strap minimizes particle generation and exhibits a lower erosion rate than the uncoated base component. A coating member coated with a flexible coating on a conductive, flexible base component allows movement of one or more electrodes in a capacitively coupled capacitively coupled plasma reactor chamber An RF ground return configured to provide is provided. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015029088-A |
| priorityDate |
2008-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |