| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2011-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_639e01273e2f6a5dd0cedb0cef672f4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c948acfcbeab22955c6f55af02cfd166 |
| publicationDate |
2013-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013097272-A |
| titleOfInvention |
Resist composition and resist pattern forming method |
| abstract |
The present invention provides a resist composition that can form a high-resolution pattern in a good shape and has little influence on the pattern size of PEB temperature, and a resist pattern forming method using the resist composition. A resist composition containing a base component (A) that generates an acid upon exposure and changes its solubility in a developer due to the action of an acid, the base component (A) comprising: A constitutional unit (a0) containing a group represented by the following general formula (a0-1) or (a0-2), and an acid-decomposable group containing a polycyclic group which has increased polarity by the action of an acid A resist composition comprising a copolymer (A1) having a unit (a11) and a structural unit (a12) having an acid-decomposable group containing a monocyclic group and having increased polarity by the action of an acid. The groups —R 3 —S + (R 4 ) (R 5 ) and M m + in the formula each have only one aromatic ring or no aromatic ring in total. [Chemical 1] [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101855230-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016035567-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016035585-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9551932-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10025186-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019035071-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016148856-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7158946-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016035585-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014145809-A |
| priorityDate |
2011-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |