| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c389d310f52125a947b3408cb0cf3283 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G101-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 |
| filingDate |
2011-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7943d9221081c8cbd8803a80b749f2f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d6790857370b6cb585773ebc260df0b |
| publicationDate |
2013-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2013066974-A |
| titleOfInvention |
Polishing pad |
| abstract |
PROBLEM TO BE SOLVED: To provide a polishing pad having improved dressing properties while maintaining hardness. The polishing pad of the present invention has a polishing layer made of a polyurethane resin foam having closed cells, and the polyurethane resin foam contains (A) an isocyanate component and (B) a polyol as raw material components. And (C) an aromatic compound having one hydroxyl group and / or an aromatic compound having one amino group. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015151784-A1 |
| priorityDate |
2011-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |