Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-427 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
2012-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bee55bb926ba2eb335beded4bd1cdcd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5194cf96303997da6da0db23a61e6b3f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa960cdf44e5db36fe194da9ca1d793f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_527a0a18dd82fd669d17092beec4a358 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_678e4c8b7d072162696184c113b435fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f556706aad418b9724317ba489dbcd75 |
publicationDate |
2013-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2013051416-A |
titleOfInvention |
Photoresist stripping process for improved device integrity |
abstract |
A method and apparatus for hydrogen-based photoresist strip processing that reduces dislocations in a silicon wafer or other substrate. Hydrogen-based photoresist stripping 1) minimizes overstripping duration and minimizes hydrogen balance by employing a short process 2) for example 2% to 16% hydrogen Supply diluted hydrogen at a concentration 3) Minimize material loss by controlling process conditions and chemical reactions 4) Perform resist stripping at low temperature 5) Control implantation conditions and concentration 6 ) Perform one or more venting processes after stripping. [Selection] Figure 2 |
priorityDate |
2011-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |