http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013032231-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bfdf49224a405be1f7b653c56ebad94 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11 |
| filingDate | 2011-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f66280786d80849c94a57541e44414c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76a061b5e3d0aa0a91fca2b659090311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24b49aff39159db5b456f12645a7e64e |
| publicationDate | 2013-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013032231-A |
| titleOfInvention | Silica film and method for forming the same |
| abstract | 【Task】 In the formation of a silica film, an easy method for forming a silica film having a large film thickness and suppressing the occurrence of cracks is provided. [Solution] The present invention uses a composition in which silica filler is mixed with hydrolyzed and dehydrated polycondensation polymer of silicon alkoxide under controlled conditions as a precursor in the formation of a silica film, and the precursor is irradiated with ultraviolet rays. By doing so, the silica film which suppressed generation | occurrence | production of a crack without heating is formed. [Selection figure] None |
| priorityDate | 2010-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 56.