abstract |
Cyanoadamantyl compounds and polymers, and photoresists containing the same United States Patent Application 20070274305 Kind Code: A1 Provided are cyanoadamantyl compounds, polymers containing polymerized units of such compounds and photoresist compositions containing such polymers. . Preferred polymers of the present invention are used in photoresists imaged at wavelengths shorter than 250 nm, such as 248 nm and 193 nm. [Selection figure] None |