| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2010-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2012-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2012518692-A |
| titleOfInvention |
Bake photoresist material after ultra low temperature exposure |
| abstract |
PROBLEM TO BE SOLVED: To provide an improved chemically amplified photoresist material and composition. The present invention relates to a first methacrylate monomer having a pendant spacer between a polymer backbone and an acid sensitive group, a second methacrylate monomer having a pendant group containing a fluorinated alkyl group, and a pendant hydrocarbon group. And a third methacrylate monomer having: The photoresist formulation includes the polymer, a photoacid generator, and a casting solvent. A method of forming a patterned photoresist film from a photoresist formulation is characterized by a post-exposure bake at a temperature of about 60 ° C. or less. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019054311-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11687001-B2 |
| priorityDate |
2009-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |