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publicationDate 2012-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012245565-A
titleOfInvention Articles for use in a semiconductor process chamber
abstract A method and system for providing a texture on the surface of a workpiece, such as a chamber component. The method includes supplying a workpiece to a texturing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features on the surface. The formed features are typically indentations, protrusions, and combinations thereof. A method for reducing contamination in the process chamber is also provided. The method includes scanning a beam of electromagnetic energy across the surface of one or more process chamber components to form a plurality of features on the surface, and one or more chamber components into the process chamber. Positioning within and initiating a process sequence within the process chamber. [Selection] Figure 1
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