| abstract |
PROBLEM TO BE SOLVED: To provide a colored pattern excellent in polymerization curability at the time of exposure, high exposure sensitivity, excellent profile characteristics even in a short heat treatment time, a photo spacer excellent in uniformity in cross-sectional shape and uniformity in height, and excellent in uniformity and hardness. Provided is a photosensitive resin composition capable of forming a protective film. An alkali-soluble resin (A), a polymerizable compound (B), and a photopolymerization initiator (C) having an acidic group and two or more different polymerizable unsaturated groups in at least side chains. ) Containing a photosensitive resin composition. [Selection figure] None |