| abstract |
A method of manufacturing an insulating film having a high mass density is proposed. An insulating film manufacturing method includes a step of forming an insulating film on a substrate and a step of processing the insulating film. The insulating film contains Si and O, and is, for example, a SiO 2 film. In the second step, the temperature of the insulating film is set to be 551 ° C. or higher and 574 ° C. or lower, and an active rare gas and active oxygen are supplied to the insulating film. [Selection] Figure 1 |