| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2012-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5783c924eb99533d01f0b89dc260e78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3da7cce5f8198286bad6706fba87bc7b |
| publicationDate |
2012-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2012226340-A |
| titleOfInvention |
Resist composition and method for producing resist pattern |
| abstract |
A resist composition capable of producing a resist pattern with less pattern collapse is provided. (A) a resin having a structural unit represented by formula (I), insoluble or hardly soluble in an alkaline aqueous solution, and soluble in an alkaline aqueous solution by the action of an acid; (B) an acid generator; (D) A resist composition containing a compound represented by the formula (II). [Wherein, ring T 1 represents a sultone ring which may have a substituent. ] [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013256652-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013041271-A |
| priorityDate |
2011-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |