http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012204429-A

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filingDate 2011-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39f4aac722387e08c6dc5c102dbd8f7d
publicationDate 2012-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012204429-A
titleOfInvention Imprint template, manufacturing method thereof, and pattern forming method
abstract PROBLEM TO BE SOLVED: To provide an imprint template capable of irradiating a photocurable resin with light of uniform light intensity in a template region, a manufacturing method thereof, and a pattern forming method. An imprint template according to an embodiment has a first substrate, and a first photo-curing resin having a first concavo-convex pattern is provided on a main surface of the first substrate. Second light having a second concavo-convex pattern having a pattern density different from that of the first concavo-convex pattern on the main surface of the first substrate and having a light transmittance different from that of the first photocurable resin. A cured resin is provided. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016207693-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015032792-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109155237-A
priorityDate 2011-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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