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filingDate 2012-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2012-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012199226-A
titleOfInvention Plasma generating apparatus, plasma processing apparatus, and plasma processing method
abstract An atmospheric pressure type plasma generation apparatus capable of generating uniform line plasma using a long waveguide and performing uniform processing on an object to be processed is provided. A plasma generation apparatus includes a microwave generation apparatus that generates a microwave, a rectangular waveguide that is connected to the microwave generation apparatus and includes an antenna unit as a part thereof, and a rectangular waveguide. A gas supply device 23 connected to the wave tube 22 and supplying a processing gas to the inside thereof, a gas in the antenna unit 40 and an exhaust device 24 for exhausting the processing container 10 as needed, a rectangular waveguide And a phase shift device 25A for changing the phase of the standing wave. The antenna unit 40 has a slot hole 41, and the processing gas supplied into the rectangular waveguide 22 in an atmospheric pressure state is turned into plasma by microwaves and emitted from the slot hole 41 toward an external object to be processed. To do. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014096270-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014175051-A
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priorityDate 2011-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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