Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7fbcdb105756f552ddf2e9ae2cfcf40a http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-4622 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-463 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-4622 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
filingDate |
2012-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16d73335e13cf4bb86b85d760ab1f244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78b4d107e1456776ed85542a8ee8e1ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_628266f4edbaa9f330cc6b83d476cb97 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cde616a5d675df55314c64169796a571 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c587eff08a68f1f813a356b890b61f20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f79854ce5875dcad8208c585b5860935 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca3123a44a7cacad2d28461a153c6e45 |
publicationDate |
2012-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2012199226-A |
titleOfInvention |
Plasma generating apparatus, plasma processing apparatus, and plasma processing method |
abstract |
An atmospheric pressure type plasma generation apparatus capable of generating uniform line plasma using a long waveguide and performing uniform processing on an object to be processed is provided. A plasma generation apparatus includes a microwave generation apparatus that generates a microwave, a rectangular waveguide that is connected to the microwave generation apparatus and includes an antenna unit as a part thereof, and a rectangular waveguide. A gas supply device 23 connected to the wave tube 22 and supplying a processing gas to the inside thereof, a gas in the antenna unit 40 and an exhaust device 24 for exhausting the processing container 10 as needed, a rectangular waveguide And a phase shift device 25A for changing the phase of the standing wave. The antenna unit 40 has a slot hole 41, and the processing gas supplied into the rectangular waveguide 22 in an atmospheric pressure state is turned into plasma by microwaves and emitted from the slot hole 41 toward an external object to be processed. To do. [Selection] Figure 1 |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014096270-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014175051-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020047515-A |
priorityDate |
2011-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |