http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012189884-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2011-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_749d48f19b19df8fd80958517557e671 |
| publicationDate | 2012-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2012189884-A |
| titleOfInvention | Resist pattern forming method and negative resist composition for development |
| abstract | A resist pattern forming method capable of forming a resist pattern having excellent etching resistance in a negative developing process, and a negative developing resist composition used in the resist pattern forming method. On a support using a resist composition comprising a base component (A) whose solubility in an organic solvent is reduced by the action of an acid and an acid generator component (B) that generates an acid upon exposure. Forming a resist film, patterning the resist film, and patterning the resist film by negative development using a developer containing an organic solvent to form a resist pattern. The base resin component (A1) is a structural unit derived from an acrylate ester and having a structural unit (a1) containing an acid-decomposable group whose polarity is increased by the action of an acid (A1). ), The acid generator component (B) contains an acid generator (B1) having a ring structure in the anion portion. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014141858-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022202345-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014182154-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012220572-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013145255-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9164384-B2 |
| priorityDate | 2011-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 551.