| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5d04736b0b882a4f5a1e0e0e4cd8cbb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate |
2012-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5d86e4bf11d80c0e0be1e7ed2359bf8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b817cb33b051796e979298956349fdf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a05296d5b4989abf281ccb4a2aee371 |
| publicationDate |
2012-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2012169649-A |
| titleOfInvention |
Polishing composition and polishing method |
| abstract |
Disclosed is a chemical mechanical polishing composition capable of simultaneously polishing a barrier film and an insulating film at high speed while suppressing dishing and erosion and maintaining flatness. A chemical-mechanical polishing composition containing a dicarboxylic acid having 7 to 13 carbon atoms, an oxidizing agent, abrasive grains, and water. The polishing composition preferably has a pH value of 2-4 or 8-12. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015019706-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017028127-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017014050-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6068647-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9685343-B2 |
| priorityDate |
2005-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |