abstract |
A method for easily producing a nanoimprint mold having a pattern pitch of 40 nm or less is provided. [Solution] In the manufacture of the nanoimprint mold according to the present invention, a metal is deposited at a desired position using a focused ion beam on a Si substrate provided with a SiO 2 layer, the substrate is heated, and the deposited metal is aggregated. A pattern of a nanoimprint mold is formed. [Selection] Figure 1 |