http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012126113-A

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filingDate 2010-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1393378da0f60dc92a89774bf1751119
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publicationDate 2012-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012126113-A
titleOfInvention Manufacturing method of nanoimprint mold using metal deposition
abstract A method for easily producing a nanoimprint mold having a pattern pitch of 40 nm or less is provided. [Solution] In the manufacture of the nanoimprint mold according to the present invention, a metal is deposited at a desired position using a focused ion beam on a Si substrate provided with a SiO 2 layer, the substrate is heated, and the deposited metal is aggregated. A pattern of a nanoimprint mold is formed. [Selection] Figure 1
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