http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012119699-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3341 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31122 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-822 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2012-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c1e4849ef6993520dc559c772ec743b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa2c5edecc34adcd046455d6d5df09ab |
| publicationDate | 2012-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2012119699-A |
| titleOfInvention | Plasma processing method, storage medium, and plasma processing apparatus |
| abstract | A plasma processing method capable of improving etching controllability of a high dielectric constant insulating film is provided. When an etching process is performed on a hafnium oxide film formed on a semiconductor device on a wafer W, the wafer W is loaded into a chamber 11 of a plasma processing apparatus 10 and C 4 is placed in a processing space S in the chamber 11. F 8 gas, carbon monoxide gas, argon gas, and xenon gas are supplied at a predetermined flow ratio, plasma is generated from the supplied processing gas by applying high frequency power to the processing space S, and C 4 F 8 is generated by xenon. The high dielectric constant insulating film is etched at a high etch rate by further promoting the dissociation of fluorine from the substrate. [Selection] Figure 1 |
| priorityDate | 2005-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.