| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition excellent in resolving power such as dimensions before bridge and exposure latitude, and a resist film and a pattern forming method using the same. A compound (A) that generates an acid upon irradiation with an actinic ray or radiation, a resin (B) that is decomposed by the action of an acid and changes its solubility in a developer, and the above-mentioned upon irradiation with an actinic ray or radiation. An actinic ray-sensitive or radiation-sensitive resin composition comprising a compound (C) that reacts with an acid generated from the compound (A) in the presence of an acid to form a covalent bond (however, the resin (B) and the compound (C) may be the same compound), and a resist film and a pattern forming method using the same compound. [Selection figure] None |