http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012036053-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3fd4c0edfe1f284b55ab1aba5d48a778 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C4-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-87 |
| filingDate | 2010-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2855963202ce1618711493405b16a5da http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c89784d72f74c321ec15e660d592188 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df7f6fb56a0e23e18bad87cd5723c113 |
| publicationDate | 2012-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2012036053-A |
| titleOfInvention | Corrosion resistant material |
| abstract | A member coated with an yttria-based film, which can be used mainly as a plasma processing apparatus member for manufacturing semiconductors and liquid crystals, has a dense and smooth surface, and particles and metal during plasma processing. Provided is a corrosion-resistant member that does not contaminate an object to be processed due to generation of impurities and has excellent durability. In a corrosion-resistant member in which a yttria-based corrosion-resistant film is formed on the surface of at least a portion of a base material made of ceramic or metal that is exposed to plasma or corrosive gas, at least the surface layer of the corrosion-resistant film is made of yttria. The other component is a composition containing 0.02 mol% or more and 10 mol% or less of tantalum pentoxide or niobium pentoxide with respect to 100 mol% of yttria. [Selection figure] None |
| priorityDate | 2010-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.