http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012033385-A

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filingDate 2010-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c4bf4066c798d58ae3ac01286bdc3d9
publicationDate 2012-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2012033385-A
titleOfInvention Plasma processing apparatus and plasma processing method
abstract A plasma processing apparatus and a plasma processing method excellent in controllability of plasma density are provided. According to an embodiment, a plasma processing apparatus including a first electrode, a second electrode, a dielectric member, and a relative permittivity control unit is provided. Plasma is generated between the first electrode and the second electrode. The dielectric member is provided between the first electrode and the second electrode. The relative dielectric constant control unit changes the relative dielectric constant of the dielectric member in a plane crossing the direction from the first electrode toward the second electrode. [Selection] Figure 1
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Total number of triples: 32.