http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011527507-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
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filingDate 2009-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2011-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2011527507-A
titleOfInvention Plasma facing probe apparatus with a vacuum gap for use in a plasma processing chamber
abstract 【Task】 An apparatus for measuring process parameters in a plasma processing chamber is provided. The apparatus includes a probe structure disposed within the opening of the upper electrode. The probe structure includes a probe head, and the probe head includes a head portion and a flange portion. The apparatus further comprises an O-ring disposed between the upper electrode and the flange portion. The apparatus further comprises a spacer formed from an electrically insulating material disposed between the head and the upper electrode opening to prevent the probe structure from touching the upper electrode. The spacer includes a disk portion configured to support the underside of the flange portion. The spacer further includes a hollow cylindrical portion configured to surround the head portion. The spacers form a right-angle path between the O-ring and the processing chamber opening to prevent a direct line-of-sight path between the O-ring and the opening to the processing chamber. [Selection] Figure 2
priorityDate 2008-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002241939-A
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Total number of triples: 29.