| abstract |
In-plane uniformity of processing can be improved, the apparatus can be reduced in size and processing efficiency can be improved, and an interval between an upper electrode and a lower electrode can be easily changed. Provided is a plasma processing apparatus. A lower electrode 202 provided in a processing chamber 201, an upper electrode 100 having a function as a shower head and capable of moving up and down, and an upper opening of the processing chamber provided above the upper electrode are hermetically sealed. A lid body 205 that is closed to the upper electrode, a plurality of exhaust holes 13 formed in the plane of the upper electrode, and is provided so as to protrude downward along the peripheral edge of the upper electrode, and moves up and down in conjunction with the electrode. An annular member 220 that forms a processing space surrounded by the lower electrode and the upper electrode in the lowered position, and is accommodated in a dielectric container 230 on the inner wall portion of the annular member. And a plasma processing apparatus including the coil 240. [Selection] Figure 1 |