| abstract |
Provided is a method for manufacturing a polysiloxane and polysilsesquioxane-based hard mask film that responds to irradiation in a positive type, a negative type, or two gradations. A catalyst capable of catalyzing a condensation reaction of polysiloxane and / or polysilsesquioxane, polysiloxane and / or polysilsesquioxane, which is easily deactivated by a photogenerated acid, A hard mask film comprising: a photoacid generator capable of generating an acid upon exposure. [Selection figure] None |