| abstract |
PROBLEM TO BE SOLVED: To pattern a silica-based coating film having a relatively high coating film strength and a relatively low dielectric constant, and having excellent surface flatness and crack resistance, and the method. It is related with the silica-type coating film obtained. SOLUTION: A method for patterning a silica-based coating film having patterning characteristics, wherein (1) a step of applying a specific coating solution for forming a silica-based coating film on a substrate; (2) on the substrate in the above step (3) a step of placing a patterning mask on the coating film dried in the step, and (4) irradiating the coating film masked in the step with ultraviolet rays. A step, (5) a step of heating the coating film irradiated with ultraviolet rays in the step, (6) a step of immersing the coating film heated in the step in a developer, and (7) immersion in the developer in the step. A method for patterning a silica-based coating film comprising a step of washing the coated film, and a silica-based coating film obtained from the method. [Selection] Figure 1 |