| abstract |
Radiation sensitive polymers and compositions that can be used in photolithography processes are provided. The polymers and compositions provide improved sensitivity to activating radiation. According to a first aspect, a polymer is provided. The polymer includes a polymer backbone and a monomeric photoacid generator covalently bonded to the polymer backbone. The photoacid generator is derived from one or more of a sulfonium salt or an iodonium salt having a polymerizable sulfonate anion. [Selection figure] None |