| abstract |
The present invention provides a lithography cleaning liquid that has an excellent function of inhibiting corrosion against tungsten and has excellent removal performance of a resist film and the like, and a wiring forming method using the cleaning liquid for lithography. A lithography cleaning liquid according to the present invention contains a quaternary ammonium hydroxide, a water-soluble organic solvent, water, an inorganic base, and an anticorrosive agent represented by the following general formula (1). . (In the formula, R 1 represents an alkyl group having 1 to 17 carbon atoms or an aryl group, and R 2 represents an alkyl group having 1 to 13 carbon atoms.) [Selection figure] None |