http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011114087-A

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filingDate 2009-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e310b9bc082613f6a880c3ce54bce465
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24f03e05e907954103c84b173e5f2164
publicationDate 2011-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2011114087-A
titleOfInvention Thin film manufacturing method and thin film element
abstract A thin film manufacturing method capable of manufacturing a thin film of stable quality at a low cost is provided. A method of manufacturing a thin film, in which a substrate 20 is placed in a raw material solution of a thin film to be formed on a substrate 20, and a light absorption rate of a solvent in the raw material solution from a first light source 13 is a predetermined value. The first light of the substrate 20 is irradiated by irradiating the first light having a wavelength that is equal to or greater than the threshold, and irradiating the second light having a wavelength lower than that of the first light from the second light source 14. A first forming step of forming a thin film on the main surface 20a. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012234927-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014154581-A
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