| abstract |
Provided is a resist composition that exhibits high resolution; good shape, focus margin (DOF), mask error factor (MEF), and CD uniformity (CDU). A resin-containing resist composition comprising repeating units derived from the compounds of formulas (I) and (II). [Wherein R 1 and R 3 are H or a halogen atom-substituted alkyl group, etc .; T is an alicyclic hydrocarbon group, and the group may be substituted with a halogen atom, a hydroxyl group, an alkyl group, an alkoxy group, etc. And —CH 2 — contained in the group is replaced by one —SO 2 —, and may be further replaced by —CO—, —O— or the like; Z 1 may have a substituent. A good saturated hydrocarbon group, —CH 2 — contained in the group may be replaced by —CO—, —O— or the like; R 4 and R 5 are H, methyl group or the like. ] [Selection figure] None |