Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2010-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_316dc9ef3e33bc1aace42938b037bf4a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5274201dd3cdbfb3b87410e86dbb2323 |
publicationDate |
2011-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2011039498-A |
titleOfInvention |
Resist composition |
abstract |
A resist composition capable of forming a pattern having excellent line edge roughness (LER) and mask error factor (MEF) is provided. A resist composition comprising a resin containing a structural unit derived from a compound represented by formula (a) and an acid generator represented by formula (I). [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7015700-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9564958-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10321294-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017206681-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111689941-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9407391-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9900786-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9860732-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022008646-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018135507-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7162713-B2 |
priorityDate |
2009-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |