| abstract |
Photolithography for microfabrication, especially lithography using a KrF laser, ultra-short ultraviolet rays, electron beams, X-rays, etc. as an exposure source has excellent etching resistance and resolution, and a good pattern shape at the substrate interface Of a positive resist composition that provides a pattern, and a pattern forming method using the same. (A) An alkali-insoluble or sparingly soluble resin having an acidic functional group protected by an acid labile group, wherein the base resin becomes alkali-soluble when the acid labile group is eliminated; B) A resist composition containing an acid generator and (C) a compound containing nitrogen as a basic component, wherein the base resin contains a repeating unit represented by the general formula (1), and 1 type, or 2 or more types of repeating units represented by formula (2) and / or (3) are contained, and among all repeating units constituting the base resin, general formulas (1), (2) and ( It contains 70 mol% or more of the repeating unit represented by 3). [Selection figure] None |