http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010541249-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32706 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32623 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265 |
| filingDate | 2008-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010541249-A |
| titleOfInvention | Charge neutralization in plasma processing equipment |
| abstract | A plasma processing apparatus includes a processing chamber, a plasma source configured to generate plasma within the processing chamber, and a platen configured to support a workpiece within the processing chamber. The platen is biased with a pulse platen signal having a pulse-on period and a pulse-off period, and accelerates ions from the plasma toward the workpiece during the pulse-on period and not during the pulse-off period. A plate is disposed in the processing chamber. The plate is biased with a plate signal to accelerate ions from the plasma toward the plate, resulting in the emission of secondary electrons from the plate during at least a portion of one pulse-off period of the pulse platen signal. And at least partially neutralize charge build-up on the workpiece. |
| priorityDate | 2007-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.