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filingDate 2006-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2008-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2008539595-A
titleOfInvention Inclined plasma doping
abstract The plasma doping apparatus (100) includes a chamber (104) and a plasma source (162) that generates ions from the dopant gas into the chamber. A grating (154) is positioned in the chamber. A platen (148) that supports the target (150) is positioned in the chamber. At least one of the grating and the target is oriented such that dopant ions extracted from the grating strike the target at a non-normal incidence angle. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020521322-A
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Total number of triples: 37.