http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010519596-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-70 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate | 2008-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010519596-A |
| titleOfInvention | COMPOSITIONS, COATINGS, AND FILMS FOR PATTERNING APPLICATIONS FOR THREE-LAYER STRUCTURES AND METHODS FOR PRODUCING THEM |
| abstract | Disclosed herein is a composition for use in a three-layer application, wherein the composition has a matrix and at least one type of silicon-based forming a polymer matrix. A polymer blend comprising a moiety, a plurality of vinyl groups attached to the polymer matrix, and a plurality of phenyl groups attached to the polymer matrix; at least one condensation catalyst; and at least one solvent. Further included herein are an organic base layer (first layer), an antireflective composition and / or a film contemplated by the present invention (second layer), and a photoresist material (third A three-layer structure is also contemplated, including A method of manufacturing a composition for a three-layer patterning application includes: at least one type of silicon-based portion that forms a polymer matrix; a plurality of vinyl groups bonded to the polymer matrix; and a plurality bonded to the polymer matrix. Supplying a polymer blend comprising a plurality of phenyl groups; feeding at least one condensation catalyst; feeding at least one solvent; feeding at least one pH adjuster; And a portion of the at least one solvent in a reactor to form a reactive mixture; and the at least one pH adjuster, the at least one condensation catalyst, and the at least one Adding the remainder of one solvent into the reaction mixture to obtain a composition. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013051558-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9337052-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021531192-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8501386-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7171123-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012053253-A |
| priorityDate | 2007-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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