http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010512650-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-427 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2007-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010512650-A |
| titleOfInvention | Dry photoresist removal process and equipment |
| abstract | PROBLEM TO BE SOLVED: To provide a method for removing a photoresist from a substrate. A processing system for implanting a dopant into a layer of the laminated film, annealing the removed laminated film, and removing the implanted laminated film is provided. If a high dopant concentration is implanted into the photoresist layer, a crust layer may form on the surface of the photoresist layer that will not be easily removed. The method described herein is effective in removing a photoresist layer having such a crust on its surface. [Selection] Figure 4 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014507073-A |
| priorityDate | 2006-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.