http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010505137-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate | 2007-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2010505137-A |
| titleOfInvention | Antireflection film composition |
| abstract | The present invention relates to a spin-on antireflective coating composition for a photoresist, comprising a polymer, a crosslinkable compound, and a thermal acid generator, wherein the polymer is 1.8 in exposure radiation used for forming an image of the photoresist. At least one functional part capable of increasing the refractive index of the antireflective coating composition to a value equal to or greater than this, and a functional part capable of absorbing the exposure radiation used to form the image of the photoresist And an antireflection film composition. The invention further relates to a method of forming an image on the antireflective coating of the invention. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10490402-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11538684-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014001313-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022114134-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016532311-A |
| priorityDate | 2006-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 160.