| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2009-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c50263ed94ea8a9aec6f6b4c0b1334a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c64bf1e627002819df6a4a811220b667
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ffe53f638eec2a80b39615c3468bfb9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022dd828ba016d1a6cf5f126c039007a |
| publicationDate |
2010-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2010210934-A |
| titleOfInvention |
Positive resist composition, resist pattern forming method, polymer compound |
| abstract |
A positive resist composition having excellent lithography properties and a resist pattern forming method using the positive resist composition are provided. A positive resist composition containing a base component (A) whose solubility in an alkali developer is increased by the action of an acid, wherein the base component (A) is a structural unit having an aromatic group. (A0), a polymer compound having a (meth) acrylate structural unit (a5) containing a cyclic group containing —SO 2 — in the ring skeleton and a structural unit (a1) containing an acid dissociable, dissolution inhibiting group (A1) is contained. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101780827-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016035567-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012177801-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012137735-A |
| priorityDate |
2009-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |