abstract |
PROBLEM TO BE SOLVED: To improve liquid crystal bias phenomenon due to overexposure in a liquid crystal process for photo-alignment used for forming an interlayer organic insulating film of TFT-LCD, and to easily adjust the resolution of a pattern. Provided is a photosensitive resin composition particularly suitable for forming a planarization film of an organic insulating film. A photosensitive resin composition for forming an interlayer organic insulating film for TFT-LCD, comprising 0.01 to 20% by mass of a UV stabilizer or a radical scavenger, A method for forming an interlayer organic insulating film for TFT-LCD using the photosensitive resin composition, and a TFT-LCD comprising a cured product of the photosensitive resin composition as an interlayer organic insulating film. |